A couple of months ago Toshiba and SK hynix settled their disagreements and announced a closer collaboration between the two. The next step in this process has been made with the signing of a definitive agreement between the two on the joint development of Nano Imprint Lithography (NIL).
Engineers from the two companies will start development of basic technologies for the process at Toshiba’s Yokohama Complex in Yokohama, Japan in April this year, targeting practical use in 2017
NIL is the one of candidate technologies for advancing the migration to future generations of memory devices. Photolithography, the current mainstream process technology, uses a laser and photosensitive mask to etch circuits on a light-sensitive coating on semiconductor wafers. NIL transfers the circuit design directly, by impressing a patterned template onto the wafer.
This has the potential to achieve finer designs, resulting in better power optimisation as well as smaller devices. It is also great to see technology companies bury the hatchet and start working together instead.
Thanks to Toshiba for providing us with this information
SpeakersSpeakersYesSpeaker amount and power output2x 2 WattDimensionsLength / Depth252.5 mmWidth614 mmHeight525.8 mmWeight7.4 kgStandards / SpecificationsAdaptive…
Thermal SpecificationsMax. TDP125 WCPUCPU ManufacturerIntelCPU SeriesIntel Core i7CPU Socket1700CPU ArchitectureIntel Alder Lake-SCPU Cores12CPU Threads20Performance Cores8Efficiency…
AOC 24B3HA2 23.6 1920x1080 VA 100Hz 1m Widescreen LED Multimedia Monitor - Black High-performance clarity…
Fan SpecificationsFan Size140 mmColourPrimary ColourBlackSecondary ColourWhiteMaterialsMaterialsAluminium, Copper, RubberLightingLightingYesLighting ColourRGBLighting CompatibilityCorsair iCUEAdditional ContentsIncluded fans2x 140 mmTypeCPU…
This monitor is built with features that make incredible visuals. With VESA ClearMR 9000 and…
The AMD RDNA™ 3 Architecture elevated by buffed cooling and power delivery to effortlessly churn…